The COPRA LS670x203-GRPE Linear Plasma Source is designed for PVD-Assist and DLC coating processes as also fast substrate cleaning and activation processes on substrate widths up to 500 mm. The COPRA LS670x203-GRPE Linear Plasma Source solutions for batch PVD drum/tool coaters are state of the art Sputter Assist solutions with benchmarking post oxidation performances for high quality and productivity markets. They can also be upgraded in order to be PECVD compliant. The exceptional post oxidation properties are gaining increasing market interest for precision optical coating applications with high throughput requirements where magnetron sputtering solutions are gaining more and more market. These LS sources in a reactive sputter set up do also increase the densification of your film providing a better stoichiometry of it thus enabling high quality decorative coatings. The COPRA LS670x203-GRPE Linear Plasma Sources are typically installed in mixed PVD/PECVD coater setups where you have movable substrates as i.e. vertical or horizontal batch/or inline coaters.